US Patent Issued to TAIMIDE TECHNOLOGY INCORPORATION on Sept. 22 for "Method for manufacturing polyimide film with reduced gloss" (Taiwanese Inventor)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,742,046, issued on Sept. 22, was assigned to TAIMIDE TECHNOLOGY INCORPORATION (Hsinchu Hsien, Taiwan).

"Method for manufacturing polyimide film with reduced gloss" was invented by Wen-Hsuan Chung (Hsinchu Hsien, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a method for manufacturing a polyimide film with a reduced gloss, which comprises providing a diamine and a diacid anhydride for polymerization in a solvent to form a polyimide precursor solution; adding 2-5 equivalents of a dehydrating agent and a catalyst into the polyimide precursor solution and then coating a carrier with the polyimide precursor solution to...