US Patent Issued to SYSMEX on March 24 for "Quality control method of specimen analysis system and specimen analysis system" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,934, issued on March 24, was assigned to SYSMEX Corp. (Kobe, Japan).

"Quality control method of specimen analysis system and specimen analysis system" was invented by Yuji Wakamiya (Kobe, Japan), Toru Uemura (Kobe, Japan), Yuichiro Ohmae (Kobe, Japan) and Hidetaka Hayama (Kobe, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A quality control method of a specimen analysis system is disclosed, including: receiving a setting of a quality control measurement condition from a user; determining at least one quality control specimen to be used for quality control measurement from among a plurality of the quality control specimens stored in a storage...