US Patent Issued to SYSMEX, OSAKA UNIVERSITY, NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY on May 5 for "Measurement sample preparation method, analysis method, reagent, and reagent kit" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,834, issued on May 5, was assigned to SYSMEX Corp. (Kobe, Japan), OSAKA UNIVERSITY (Osaka, Japan) and NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Tokyo).

"Measurement sample preparation method, analysis method, reagent, and reagent kit" was invented by Yuki Shimaoka (Kobe, Japan), Masaya Okada (Kobe, Japan), Shigeki Iwanaga (Kobe, Japan), Kazuki Bando (Suita, Japan), Katsumasa Fujita (Suita, Japan), Yasunori Nawa (Ikeda, Japan) and Satoshi Fujita (Ikeda, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a preparation method for preparing a measurement sample comprising an aggregate of metal nanoparticles having an...