ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,842, issued on Oct. 20, was assigned to Surfx Technologies LLC (Redondo Beach, Calif.).

"Device and method for plasma treatment of electronic materials" was invented by Thomas Scott Williams (Los Angeles) and Robert F. Hicks (Los Angeles).

According to the abstract* released by the U.S. Patent & Trademark Office: "Plasma applications are disclosed that operate with argon and other molecular gases at atmospheric pressure, and at low temperatures, and with high concentrations of reactive species. The plasma apparatus and the enclosure that contains the plasma apparatus and the substrate are substantially free of particles, so that the substrate does not become contaminated with par...