US Patent Issued to SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY on June 16 for "Ion implanter and ion implantation method" (Japanese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,658,404, issued on June 16, was assigned to SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY Co. LTD. (Tokyo).

"Ion implanter and ion implantation method" was invented by Taisei Futakuchi (Ehime, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An ion implanter includes a high energy multi-stage linear acceleration unit including a plurality of linear acceleration units, wherein each of the linear acceleration units includes high frequency accelerators respectively in a plurality of stages; and a control device controlling an operation of the high energy multi-stage linear acceleration unit in accordance with a data set defining a voltage amplitude, a frequ...