ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,712,144, issued on Aug. 18, was assigned to Sumitomo Heavy Industries Ion Technology Co. Ltd. (Tokyo).
"Ion generation device and ion implanter" was invented by Sho Kawatsu (Ehime, Japan) and Masateru Sato (Ehime, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An ion generation device includes an arc chamber including an internal space and including a front slit for extracting an ion beam from plasma generated in the internal space, a magnetic field generator that generates a magnetic field applied in an axial direction in the internal space, and a first cathode configured to supply a thermoelectron into the internal space. The first cathode inclu...