US Patent Issued to SUMITOMO ELECTRIC INDUSTRIES on June 2 for "Method for producing fluorine-containing silica glass" (Japanese Inventors)

ALEXANDRIA, Va., June 2 -- United States Patent no. 12,643,812, issued on June 2, was assigned to SUMITOMO ELECTRIC INDUSTRIES LTD. (Osaka, Japan).

"Method for producing fluorine-containing silica glass" was invented by Shinji Ishikawa (Osaka, Japan), Tetsuya Haruna (Osaka, Japan), Keisei Morita (Osaka, Japan), Tatsuro Hasegawa (Osaka, Japan) and Seiji Arakawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for producing fluorine-containing silica glass is disclosed. The method includes decompression degassing which includes degassing an inside of a furnace core tube under reduced pressure while heating the inside of the furnace core tube, after inserting a porous silica glass body into...