US Patent Issued to Sumitomo Chemical on Aug. 11 for "Salt, acid generator, resist composition and method for producing resist pattern" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,781, issued on Aug. 11, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Salt, acid generator, resist composition and method for producing resist pattern" was invented by Katsuhiro Komuro (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a salt represented by formula (I), an acid generator, and a resist composition:wherein Q1, Q2, R1 and R2 each represent a hydrogen atom, a fluorine atom, an alkyl group, etc.; z represents an integer of 0 to 6; X1 represents *-CO-O-, *-O-CO-, etc.; L1 and L2 each represent a single bond or an aliphatic hydrocarbon group; Ar1 represents an aromatic hydroca...