ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,930, issued on April 21, was assigned to Sumitomo Chemical Co. Ltd. (Tokyo).

"Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern" was invented by Katsuhiro Komuro (Osaka, Japan) and Koji Ichikawa (Osaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a carboxylate represented by formula (I), a carboxylic acid generator and a resist composition:wherein L1 and L2 each represent a single bond or a hydrocarbon group which may have a substituent, -CH2- included in the hydrocarbon group may be replaced by -O-, -S-, -SO2- or -CO-, Ar1 represents an aromatic hydrocarbon group or a heterocy...