US Patent Issued to STMICROELECTRONICS on Feb. 17 for "Method for manufacturing an integrated system including a capacitive pressure sensor and an inertial sensor, and integrated system" (Italian Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,552,665, issued on Feb. 17, was assigned to STMICROELECTRONICS S.r.l. (Agrate Brianza, Italy).

"Method for manufacturing an integrated system including a capacitive pressure sensor and an inertial sensor, and integrated system" was invented by Paolo Ferrari (Gallarate, Italy), Lorenzo Corso (Ruginello, Italy), Flavio Francesco Villa (Milan), Silvia Nicoli (Casatenovo, Italy) and Luca Lamagna (Cassina de' Pecchi, Italy).

According to the abstract* released by the U.S. Patent & Trademark Office: "Method for manufacturing a micro-electro-mechanical system, MEMS, integrating a first MEMS device and a second MEMS device. The first MEMS device is a capacitive pressure sensor and the second...