US Patent Issued to SPP Technologies on Nov. 3 for "Substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,785,052, issued on Nov. 3, was assigned to SPP Technologies Co. Ltd. (Tokyo).

"Substrate processing apparatus" was invented by Kazuya Ota (Amagasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a lower chamber, an upper chamber, and a lift mechanism. The upper chamber includes a first assembly, a second assembly, and a lock mechanism to releasably couple the first assembly to the second assembly. The first assembly includes a top plate and a first cover, and is coupled to the lift mechanism from an outside of the first cover. The lock mechanism is on a position closer to an inner periphery than a periphe...