US Patent Issued to South Dakota Board of Regents on May 12 for "High shear thin film machine for dispersion and simultaneous orientation-distribution of nanoparticles within polymer matrix" (South Dakota Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,623,193, issued on May 12, was assigned to South Dakota Board of Regents (Pierre, S.D.).

"High shear thin film machine for dispersion and simultaneous orientation-distribution of nanoparticles within polymer matrix" was invented by Ilchgerel Dash (Rapid City, S.D.) and Robb M. Winter (Rapid City, S.D.).

According to the abstract* released by the U.S. Patent & Trademark Office: "An improved a device and method for dispersion and simultaneous orientation of nanoparticles within a matrix is provided. A mixer having a shaft and a stator is provided. The shaft may have a rupture region and erosion region. Further, an orienter having an angled stationary plate and a moving plate are provide...