US Patent Issued to Solstice Advanced Materials US on July 14 for "Methods for removal of sulfur dioxide (SO 2 ) from trifluoroacetyl chloride (TFAC)" (New York, North Carolina, New Jersey Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,679,800, issued on July 14, was assigned to Solstice Advanced Materials US Inc. (Morris Plains, N.J.).

"Methods for removal of sulfur dioxide (SO 2 ) from trifluoroacetyl chloride (TFAC)" was invented by Haluk Kopkalli (Staten Island, N.Y.), Haiyou Wang (Amherst, N.Y.), Terris Yang (East Amherst, N.Y.), Jennifer W. McClaine (Branchburg, N.J.), Richard Wilcox (West Caldwell, N.J.), Joshua Close (Cheektowaga, N.Y.) and Rajendar Mallepally (Charlotte, N.C.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Impurities such as sulfur dioxide (SO2) are removed from trifluoroacetyl chloride (TFAC) through distillation, adsorption, or a combination thereof, and/or ...