US Patent Issued to SK SILTRON on April 7 for "Apparatus for analyzing metal contamination of a wafer and a method thereof" (South Korean Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,596,078, issued on April 7, was assigned to SK SILTRON Co. LTD. (Gumi-si, South Korea).

"Apparatus for analyzing metal contamination of a wafer and a method thereof" was invented by Woo Young Park (Gumi-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for analyzing metal contamination of a wafer comprises obtaining a contamination level of a first metal and a contamination level of a second metal for the wafer, obtaining a correction value by substituting the obtained contamination level of the second metal into a correlation equation, and obtaining a final contamination level of the first metal, by correcting the contamination le...