ALEXANDRIA, Va., March 3 -- United States Patent no. 12,568,623, issued on March 3, was assigned to SK hynix Inc. (Icheon-si, South Korea).
"Manufacturing method of semiconductor device" was invented by Jong Gi Kim (Icheon-si, South Korea), Young Jin Noh (Icheon-si, South Korea), Jae O Park (Icheon-si, South Korea), Jin Ho Bin (Icheon-si, South Korea), Dong Chul Yoo (Icheon-si, South Korea) and Yoo Il Jeon (Icheon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method of a semiconductor device may include: forming a stack comprising first material layers and second material layers that are alternately stacked; forming an opening in the stack; forming a first seed layer in the o...