US Patent Issued to SK hynix on June 23 for "Semiconductor device and manufacturing method of a semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,620, issued on June 23, was assigned to SK hynix Inc. (Gyeonggi-do, South Korea).

"Semiconductor device and manufacturing method of a semiconductor device" was invented by Seok Min Choi (Gyeonggi-do, South Korea) and Jung Shik Jang (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device may include: a plurality of word lines; a select line; a channel layer extending into the select line through the word lines; a floating gate surrounding sidewalls of the channel layer between the channel layer and the select line; and a charge trap layer including a first and a second portion, wherein the first portion surroun...