US Patent Issued to SK hynix on June 23 for "Method of predicting an optimal process condition model to improve a yield of a semiconductor fabrication process and method of controlling a semiconductor fabrication process based on an optimal process condition model" (South Korean Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,786, issued on June 23, was assigned to SK hynix Inc. (Icheon-si, South Korea).

"Method of predicting an optimal process condition model to improve a yield of a semiconductor fabrication process and method of controlling a semiconductor fabrication process based on an optimal process condition model" was invented by Jin Hee Han (Icheon-si, South Korea), Seong Min Ma (Icheon-si, South Korea), Deuk Nyeon Lee (Icheon-si, South Korea) and Chang Hwan Lee (Icheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a method of predicting an optimal process condition model for a semiconductor fabrication process, process parameter information ...