US Patent Issued to SK hynix on June 16 for "Semiconductor device and manufacturing method of the semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,660,186, issued on June 16, was assigned to SK hynix Inc. (Icheon-si, Japan).

"Semiconductor device and manufacturing method of the semiconductor device" was invented by Jung Shik Jang (Icheon-si, South Korea), In Su Park (Icheon-si, South Korea), Won Geun Choi (Icheon-si, South Korea), Jung Dal Choi (Icheon-si, South Korea), Rho Gyu Kwak (Icheon-si, South Korea) and Seok Min Choi (Icheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device including: a gate structure including stacked gate lines; an insulating core located in the gate structure and including a first long axis and a first short axis; a memory layer surro...