US Patent Issued to SK hynix on Feb. 17 for "Semiconductor device and manufacturing method of the semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,282, issued on Feb. 17, was assigned to SK hynix Inc. (Icheon-si, South Korea).

"Semiconductor device and manufacturing method of the semiconductor device" was invented by Won Geun Choi (Icheon-si, South Korea) and Jung Shik Jang (Icheon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device, and a method of manufacturing the semiconductor device, includes: a gate structure including conductive layers and insulating layers, which are alternately stacked; a channel structure including a first channel structure and a second channel structure aligned in a first direction, and the channel structure penetrating the gate str...