US Patent Issued to SK hynix, POSTECH ACADEMY-INDUSTRY FOUNDATION on Feb. 17 for "Method and apparatus for setting semiconductor device manufacturing parameter" (South Korean Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,554,246, issued on Feb. 17, was assigned to SK hynix Inc. (Icheon, South Korea) and POSTECH ACADEMY-INDUSTRY FOUNDATION (Pohang, South Korea).

"Method and apparatus for setting semiconductor device manufacturing parameter" was invented by Choong Ki Kim (Icheon, South Korea), Hong Chul Byun (Icheon, South Korea), Hyeok Yun (Pohang, South Korea) and Rock Hyun Baek (Pohang, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Determining a semiconductor device manufacturing parameter may include determining an EPM (electrical measurement parameters) group that has a correlation in a baseline EPM dataset including EPMs of a device manufactured under a...