ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,445, issued on May 19, was assigned to SILTRONIC AG (Munich).
"Device for drying semiconductor substrates" was invented by Sebastian Geissler (Brand-Erbisdorf, Germany) and Simon Rothenaicher (Erlbach, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device is for drying disc-shaped substrates. The device has an elongated body, which tapers upwards to form a wedge having an angle Alpha between two surfaces and an upper edge. The upper edge is suitable for holding the disc-shaped substrates. The two surfaces have more than one hole, each forming channels, which extend to a lower drainage part of the elongated body."
The patent was filed on No...