ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,716,652, issued on Aug. 25, was assigned to SILTRONIC AG (Munich).
"Device for drying semiconductor substrates" was invented by Sebastian Geissler (Brand-Erbisdorf, Germany) and Simon Rothenaicher (Erlbach, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "A device is for drying disc-shaped substrates. The device has an elongated body having a top surface, a bottom surface, and a circumferential surface. The elongated body has a hole in the top surface forming a channel, which extends to a lower drainage part of the elongated body, and is chamfered having a chamfer depth and a chamfer angle forming an edge between the chamfer and the top surface an...