US Patent Issued to Shincron on July 14 for "Film formation control device, film formation device and film formation method" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,157, issued on July 14, was assigned to Shincron Co. Ltd. (Kanagawa, Japan).

"Film formation control device, film formation device and film formation method" was invented by Yoshiyuki Ohtaki (Kanagawa, Japan), Takayuki Matsudaira (Kanagawa, Japan), Takeshi Yamaguchi (Kanagawa, Japan) and Mitsuhiro Miyauchi (Kanagawa, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a light source (42) that irradiates a substrate (S) with light, the substrate being disposed on a rotating body (25); a light receiving unit (46) that receives transmitted light or reflected light, the transmitted light being emitted from the light source and transmitted ...