US Patent Issued to SHIN-ETSU CHEMICAL on Sept. 8 for "Composition for forming organic film, patterning process, and compound and polymer for forming organic film" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,377, issued on Sept. 8, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Composition for forming organic film, patterning process, and compound and polymer for forming organic film" was invented by Daisuke Kori (Joetsu, Japan) and Naoki Kobayashi (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An organic film forming composition, containing: a material shown by formula (I) and/or (II); and an organic solvent, where R1 and R4 each represent a hydrogen atom, an allyl or propargyl group, R2 and R5 each represent a substituent, R3 and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkynyl group having 2 t...