US Patent Issued to SHIN-ETSU CHEMICAL on March 24 for "Photoacid generator, chemically amplified resist composition, and patterning process" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,585,186, issued on March 24, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Photoacid generator, chemically amplified resist composition, and patterning process" was invented by Tomomi Watanabe (Joetsu, Japan), Takayuki Fujiwara (Joetsu, Japan) and Koji Hasegawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An onium salt consisting of an anion containing an iodized aromatic group and two sulfonate groups and a sulfonium or iodonium cation is a useful photoacid generator. A chemically amplified resist composition comprising the photoacid generator forms a pattern of rectangular profile with a good balance of sensitivity, CDU, LWR, MEF, an...