US Patent Issued to Shin-Etsu Chemical on March 24 for "Composition for forming organic film, patterning process, and compound" (Japanese Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,584,023, issued on March 24, was assigned to Shin-Etsu Chemical Co. LTD. (Tokyo).

"Composition for forming organic film, patterning process, and compound" was invented by Daisuke Kori (Joetsu, Japan) and Shohei Iwamori (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A composition for forming an organic film, including: a compound represented by the following general formula (1); and an organic solvent, wherein in the general formula (1), X represents any one group of X1 to X3 represented by the following general formulae (2), (3), and (5), and two or more kinds of X are optionally used in combination, wherein in the general formula (3), W...