US Patent Issued to SHIN-ETSU CHEMICAL on March 17 for "Film-forming material, film-forming slurry, spray coated film, and spray coated member" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,647, issued on March 17, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Film-forming material, film-forming slurry, spray coated film, and spray coated member" was invented by Ryo Iwasaki (Echizen, Japan), Yuji Kimura (Echizen, Japan), Shigeyuki Nakamura (Echizen, Japan), Hajime Nakano (Echizen, Japan) and Kohei Maruko (Echizen, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The film is formed using one of two film-forming materials. The first film-forming material contains: particles containing a crystal phase of a rare earth element fluoride; particles containing a crystal phase of a rare earth element oxide; and particles containing...