ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,748, issued on June 30, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).
"Chemically amplified resist composition and patterning process" was invented by Jun Hatakeyama (Joetsu, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a quencher and an acid generator is provided. The quencher is a compound having a nitro-substituted aromatic moiety-containing acid labile group and a heterocyclic amine structure in its molecule. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone."
The patent was filed on Feb. 28, 2023, u...