US Patent Issued to Shin-Etsu Chemical on June 23 for "Advanced lift method and apparatus for transferring optical devices using laser emission and photomask techniques" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,667,011, issued on June 23, was assigned to Shin-Etsu Chemical Co. Ltd. (Tokyo).

"Advanced lift method and apparatus for transferring optical devices using laser emission and photomask techniques" was invented by Hiroshi Yamaoka (Yokohama, Japan), Nobutaka Uemori (Kashiwa, Japan), Satoki Nakada (Yokohama, Japan), Takeshi Saito (Yokohama, Japan), Shusaku Ozawa (Funabashi, Japan), Shinichi Sato (Sakura, Japan), Masami Kurata (Nerima-ku, Japan), Masahiko Sato (Edogawa-ku, Japan), Tsukasa Abe (Meguro-ku, Japan), Tsuyoshi Noguchi (Adachi-ku, Japan) and Taketo Usami (Shinagawa-ku, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention prov...