US Patent Issued to SHIN-ETSU CHEMICAL on June 16 for "Method for producing laminate, producing apparatus for laminate, laminate, and semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,660,520, issued on June 16, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Method for producing laminate, producing apparatus for laminate, laminate, and semiconductor device" was invented by Hiroshi Hashigami (Annaka, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method producing a laminate with a semiconductor film that has a corundum crystal structure, includes the steps of mounting a substrate on a stage; heating the substrate, atomizing a raw material solution for film deposition, forming a gaseous mixture by mixing the atomized raw material solution for film deposition and carrier gas; and forming the film deposition by supplying t...