US Patent Issued to SHIN-ETSU CHEMICAL on July 14 for "Positive resist composition and pattern forming process" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,681,388, issued on July 14, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo).

"Positive resist composition and pattern forming process" was invented by Jun Hatakeyama (Joetsu, Japan) and Masahiro Fukushima (Joetsu, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition comprising a base polymer comprising repeat units containing a tertiary ester group having a double or triple bond and a halogenated aromatic group exhibits a high sensitivity and resolution and forms a pattern of satisfactory profile having reduced edge roughness or size variation."

The patent was filed on March 24, 2023, under Application No. 18/126,158.

*For fur...