US Patent Issued to Shenzhen Kaiyan Medical Equipment on April 21 for "Phototherapy mask" (Chinese, Dutch Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. D1,123,177, issued on April 21, was assigned to Shenzhen Kaiyan Medical Equipment Co. Ltd. (Shenzhen, China).

"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Li Xiang (Shenzhen, China), Chen Shoufeng (Shenzhen, China) and Ye Qi (Shenzhen, China).

The patent was filed on Feb. 25, 2025, under Application No. D/990,827.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1123177&OS=D1123177&RS=D1123177

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