US Patent Issued to Shenshon Kalyan Medical Exipmord on July 14 for "Phototherapy mask" (Chinese, Dutch Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. D1,134,907, issued on July 14, was assigned to Shenshon Kalyan Medical Exipmord Co. Ltd. (Shenzhen, China).

"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Li Xiang (Shenzhen, China), Hu Chunlei (Shenzhen, China) and Zhang Yong (Shenzhen, China).

The patent was filed on May 28, 2025, under Application No. D/005,653.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1134907&OS=D1134907&RS=D1134907

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