ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,776,007, issued on Oct. 27, was assigned to SHANGHAI UNITED IMAGING HEALTHCARE Co. LTD. (Shanghai).
"Systems and methods for artifact removing" was invented by Biao Li (Shanghai) and Yanyan Liu (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and a system for training an initial artifact removal model may be provided. One or more first initial images, one or more objective feature maps corresponding to the one or more first initial images, and one or more reference images corresponding to the one or more first initial images may be obtained. A trained artifact removal model may be generated by training the initial artifact removal model...