ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,798, issued on May 19, was assigned to SHANGHAI RUIYU BIOTECH Co. LTD. (Shanghai).

"Culture devices" was invented by Xuan Wang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "One or more embodiments of the present disclosure relate to a culture device, which comprises: an accommodation base, an accommodation chamber disposed on the accommodation base. The accommodation chamber includes a culture chamber for accommodating one or more cultures. The culture chamber includes a chamber bottom wall and a chamber side wall surrounding the chamber bottom wall. A culture solution channel is formed between an outer side of the chamber side wall and an...