US Patent Issued to Shanghai GND eTech on Nov. 3 for "Thermal process monitor" (Chinese Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,782,204, issued on Nov. 3, was assigned to Shanghai GND eTech Co. Ltd (Shanghai).

"Thermal process monitor" was invented by Liansheng Cao (Shanghai) and Wenlong Zhu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A thermal process monitor is provided for determining thermal characteristics in a heating process. The monitor comprises a compartment attached to an enclosed elongated housing, wherein the compartment is filled with a temperature sensitive powder-like material. The material is expandable in response to increase in temperature, resulting in its volume expansion into the elongated housing, and the volume expansion is irreversible agains...