US Patent Issued to Shanghai Fosun Pharmaceutical Industrial Development on Sept. 8 for "Amide oxazole compound" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,729,198, issued on Sept. 8, was assigned to Shanghai Fosun Pharmaceutical Industrial Development Co. Ltd. (Shanghai).

"Amide oxazole compound" was invented by Jianfei Wang (Shanghai), Haizhong Tan (Shanghai), Yang Zhang (Shanghai), Jian Li (Shanghai) and Shuhui Chen (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an amide oxazole compound, in particular a compound, as represented by formula (IV), or a pharmaceutically acceptable salt thereof."

The patent was filed on Dec. 20, 2021, under Application No. 18/269,065.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parse...