ALEXANDRIA, Va., April 7 -- United States Patent no. 12,597,292, issued on April 7, was assigned to Seoul National University R&DB Foundation (Seoul, South Korea).
"Gait analysis apparatus and method" was invented by Je Hee Lee (Seoul, South Korea), Beom Seok Jeon (Seoul, South Korea), Jung Hwan Shin (Seoul, South Korea) and Ri Yu (Hwaseong-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A gait analysis method includes collecting a two-dimensional gait video of a subject's gait situation during a preset time, which is captured using a camera; generating a three-dimensional coordinate system based on at least one frame of the two-dimensional gait video by receiving three-dimensional information...