US Patent Issued to Sennics on July 28 for "Polyalkyl p-phenylenediamine anti-degradants and intermediates and preparation method thereof" (Chinese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,692,220, issued on July 28, was assigned to Sennics Co. Ltd. (Shanghai).

"Polyalkyl p-phenylenediamine anti-degradants and intermediates and preparation method thereof" was invented by Jinguo Xing (Shanghai), Xiangyun Guo (Shanghai), Gan Liang (Shanghai), Jiaqiang Zhang (Shanghai) and Zhimin Tang (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A polyalkyl p-phenylenediamine antidegradant having a structure represented by Formula I, its intermediates and a preparation method thereof are provided. The polyalkyl p-phenylenediamine antidegradant provides good thermal oxidative aging resistance and UV aging resistance."

The patent was filed on Dec....