ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,421, issued on Sept. 1, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Substrate processing apparatus and substrate processing method" was invented by Young Joon Han (Chungcheongnam-do, South Korea), Gi Hun Choi (Chungcheongnam-do, South Korea), Seung Tae Yang (Chungcheongnam-do, South Korea), Sang Woo Park (Chungcheongnam-do, South Korea), Seong Hyeon Kim (Chungcheongnam-do, South Korea) and Bu Young Jung (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a nozzle unit including a nozzle tip discharging liquid to a substrate; and a liquid supply line supplying ...