ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,754,475, issued on Oct. 6, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea).
"Apparatus for treating substrate and method for treating a substrate" was invented by Hyun Yoon (Seoul, South Korea), Ki Hoon Choi (Cheonan-si, South Korea), Seung Un Oh (Cheonan-si, South Korea), Young Ho Park (Incheon, South Korea), Sang Hyeon Ryu (Yangpyeong-gun, South Korea), Tae Hee Kim (Yongin-si, South Korea) and Sang Gun Lee (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating method. The substrate treating method includes pre-treating a substrate by cleaning the substrate; etching the subs...