ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,772,756, issued on Oct. 20, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Insulation plate and substrate processing apparatus including the same" was invented by Dong Mok Lee (Chungcheongnam-do, South Korea), Jin Il Sung (Gyeonggi-do, South Korea) and Soo Woong Kim (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for processing a substrate using plasma, in which an etching rate can be controlled using an insulation plate provided with an air-gap. The substrate processing apparatus includes a chamber including a processing space for processing a substrate using plasma, and a support mod...