ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,787,679, issued on Nov. 3, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Integrated exhaust duct and substrate processing apparatus" was invented by Joon Hwan Jang (Chungcheongnam-do, South Korea), Jong Han Kim (Sejong-si, South Korea) and Dong Gyu Lee (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides an integrated exhaust duct and a substrate processing apparatus.The integrated exhaust duct according to the present disclosure includes: an integrated duct body having a plurality of exhaust regions and an exhaust hole communicating with the plurality of exhaust regions; and a...