ALEXANDRIA, Va., May 5 -- United States Patent no. 12,620,558, issued on May 5, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Apparatus for processing substrate and method of processing substrate" was invented by Sang Lim Kim (Cheonan-si, South Korea), Hyun Kyu Choi (Cheonan-si, South Korea), Do Hwan Jung (Cheonan-si, South Korea) and Jin Kyu Choi (Asan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of processing a substrate using an apparatus for processing a substrate, which generates plasma in a processing space by applying microwaves is provided, the method including a plasma treatment operation of processing a substrate using plasma; a replacing operation of ...