US Patent Issued to SEMES on May 19 for "Flow velocity increasing device and apparatus for depositing thin film including the same" (South Korean Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,630,923, issued on May 19, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).

"Flow velocity increasing device and apparatus for depositing thin film including the same" was invented by Sun Il Kim (Chungcheongnam-do, South Korea), Sung Nam Yoo (Chungcheongnam-do, South Korea) and Jin Il Sung (Chungcheongnam-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A flow velocity increasing device of an apparatus for depositing a thin film includes a device body disposed within the chamber and a flow velocity increasing hole portion formed in the device body and tapered in a direction of gas passage so that a flow velocity of passed ga...