ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,396, issued on May 19, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Drying apparatus and substrate treating apparatus" was invented by Hae-Won Choi (Daejeon, South Korea), Jae Seong Lee (Hwaseong-si, South Korea) and Hong Chan Cho (Goyang-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a first chamber having a supply port for supplying a treating fluid; a second chamber in combination with the first chamber defining a treating space; a support member configured to support a substrate in the treating space; and a baffle...