ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,493, issued on June 30, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate processing device and substrate processing method" was invented by Min Jung Kim (Bucheon-si, South Korea) and Moon Sik Choi (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate processing apparatus including: a support unit for supporting a substrate and rotating the substrate; a solution discharge unit for discharging a processing solution including a first material and a second material onto the substrate to remove a film on the substrate; and a controller for controlling the solution discharge unit, in wh...