US Patent Issued to SEMES on July 7 for "Substrate processing system and process gas supply control verification method" (South Korean Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,627, issued on July 7, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).

"Substrate processing system and process gas supply control verification method" was invented by Tae Sung Kim (Cheonan-si, South Korea), Duk Hyun Son (Cheonan-si, South Korea) and Kwang Pyo Lee (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed are a substrate processing system and a process gas supply control verification method and, more particularly, to a technology to verify the operation of a mass flow controller (MFC) that supplies a process gas for semiconductor processing at an appropriate flow rate according to a recipe."

The paten...