ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,711, issued on July 28, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).
"Substrate treating apparatus and substrate treating method" was invented by Dong Hwa Lee (Chungcheongnam-do, South Korea), Dai Geon Yoon (Chungcheongnam-do, South Korea), Soo Hong Lee (Gyeonggi-do, South Korea) and Ji Hyeon Kim (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a substrate treating apparatus and a substrate treating method capable of preventing settling of a chemical without using a stirrer. The substrate treating apparatus according to the present disclosure includes: a main tank in which a chemical for...