ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,552,151, issued on Feb. 17, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).
"Substrate processing apparatus and method" was invented by Kug Jin Yoon (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus and method capable of responding to jetting abnormalities in real time are provided. The substrate processing apparatus includes: a first stage supporting a substrate; an inkjet head unit ejecting a substrate processing liquid onto the substrate as droplets; a gantry unit moving the inkjet head unit on the first stage; a droplet inspection unit inspecting the droplets; and a contr...